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Tcursor® series: Rudense® for Area Selective Deposition

Rudense

precursor, thermal properties

                    Melting point        :27°C
                    Vapor pressure    :0.1Torr @76°C
                    Decomp. temp.    :230°C
                    Viscosity              :15cP @65°C

Thermal Properties

Thermal-Properties.png

Thermal CVD with NH3

  


Temperature Dependency (on SiO2 sub.)

Temperature-Dependency-on-SiO2-sub.-.png


Step Coverage

Step-Coverage.png

Step coverage ~80%(Aspect ratio ~4)

Area Selective Deposition with Non-Oxidative Conditions (CVD Process)

 


5-update.png		 SEM Images

precursor, thermal properties